Preferential zinc sputtering during the growth of aluminum doped zinc oxide thin films by radio frequency magnetron sputtering

Cathodoluminescence Study of Gadolinium–Doped Yttrium Oxide Thin Films Deposited By Radio–Frequency Magnetron Sputtering

A multi–layer gadolinium–doped yttrium oxide thin film was deposited in a combinatorial fashion on a Si (001) substrate using radio–frequency magnetron sputtering. Alternating layers of Y2O3 and Gd were deposited for a total of 9 layers. The film was homogenized in composition by an 850 C 12 hour thermal treatment producing a range of composition from Y1.96Gd0.04O3 – Y1.54Gd0.46O3 in a single f...

Deposition of aluminum-doped zinc oxide films by RF magnetron sputtering and study of their structural, electrical and optical properties

Highly oriented undoped and aluminum-doped ZnO (AZO) films in the (002) direction were prepared by RF magnetron sputtering on glass substrates with specifically designed ZnO targets containing different amounts of Al(OH) powder as doping 3 source. A systematic study of the influence of deposition parameters such as Al(OH) content in the target, the target–substrate 3 distance (D ), deposition t...

Visible Luminescence of Rare Earth Ions Doped Amorphous Zinc Oxide Thin Films Grown by Sputtering Technique

Nitrogen and Aluminum Doped Diamond-like Carbon Thin Films by Dc Magnetron Sputtering Deposition

Diamond-like carbon (DLC) thin films used in this study were prepared with DC magnetron sputtering deposition. Silicon (100) wafers were used as the substrates onto which an RF bias was applied during the film deposition. For the nitrogen doped DLC films, a pure graphite target was used as the carbon source and nitrogen gas was introduced into the deposition chamber via a mass flow controller. ...

Characteristics of ZnO thin films prepared by radio frequency magnetron sputtering

We investigated in this study structural and nanomechanical properties of zinc oxide (ZnO) thin films deposited onto Langasite substrates at 200 C through radio frequency magnetron sputtering with an radio frequency power at 200 W in an O2/Ar gas mixture for different deposition time at 1, 2, and 3 h. Surface morphologies and crystalline structural characteristics were examined using X-ray diff...